Mask Aligner

Purpose PR exposure and polymer UV hardening
Specifications 1. Photo mask size : 5"
2. Wafer size : < 4"
3. Light source : Mercury lamp 200W
4. Resolution : 1 m
5. Back side align : Infrared illumination.
6. Manual wafer load/unload
7. Alignment mode : manual
Option  
Model / Company Q4000 INFRARED MASK ALIGNER / QUINTEL CORPORATION